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Research
Silicon carbide (SiC) is a highly promising material for neural implants, owing to its chemical inertness, biocompatibility. Multi-electrode arrays (MEAs) have been successfully developed, with a focus on enhancing the electrochemical performance of these devices. This has been achieved through nanostructuring of the electrode surface, which effectively increases the active surface area. Notably, nanopillars have been fabricated using electron-beam lithography and plasma etching. The results demonstrate that nanostructuring is a promising approach for modulating the impedance of small-dimension electrodes.
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