PESM & PlaCEP 2024

The objective of the PESM/PlaCEP workshops is to provide a forum for open discussions between science and technology. It is not only dedicated to scientists, process engineers and Ph-D students, but also to industrial partners in the field of dry etching, including plasma processing but also other vacuum-based removal techniques (ion beam, neutral beam, gaseous thermal etching, etc...). 

Topics may include both fundamental and applied research highlights, as well as issues related to the introduction of new technologies into manufacturing.

PESM 2024 is the 14th event in a series devoted to plasma etch and strip processes for micro-, nano- and bio-technologies. PlacCEP is the 2nd workshop on plasma cryogenic etch processes.