Diagnosis of gaseous effluents from a plasma etching reactor to develop more environmentally responsible processes in microelectronics

CONTEXT

The use of gases with low global warming potential (GWP) in microelectronics etching processes has become crucial to reducing the environmental footprint of the microelectronics industry. Traditionally used fluorinated gases such as CF₄ and C₄F₈ have extremely high GWPs and long atmospheric lifetimes, contributing to climate change. The use of alternative low-GWP gases, combined with reactor effluent abatement systems, should make it possible to reconcile the performance of plasma etching processes with environmental responsibility. Ultimately, innovation in this area will enhance the sustainability of manufacturing chains while ensuring the competitiveness of industry players. Improving sustainability through new technological solutions is at the heart of the PEPR electronics projects (power electronics, sensors, and telecommunications).
 

TASK

In this context and in an innovative environment at the crossroads of research and industry, working with experts from Leti and LTM, you will be responsible for:

- Analyze and characterize, using mass spectrometry, the gases present in a real industrial plasma, and compare them with those present at the outlet of the reactor pumps and the abatement system
- Contribute to understanding the formation/destruction of high GWP gaseous effluents at the plasma and pumping and abatement systems
- Determine the destruction rate of high GWP fluorocarbon gases used in etching processes at the plasma and pumping and abatement systems level
- Propose alternative and innovative solutions to minimize the release of high GWP gaseous effluents
- Promote your activities through the patents and publications you propose, and the conferences you participate in.

Location and contacts

Grenoble, Auvergne-Rhône-Alpes
Leti: Thierry Chevolleau (thierry.chevolleaucea.fr (thierry[dot]chevolleau[at]cea[dot]fr))
LTM: Gilles Cunge (gilles.cungecea.fr (gilles[dot]cunge[at]cea[dot]fr))