The NNT 2025 conference was an opportunity to celebrate the 30th anniversary of the development of nanoimprint lithography (NIL) technologies. NIL techniques were first developed in Princeton, US, by S. Chou's team, and a project to develop these techniques began in Grenoble in 2000 as a collaboration between LTM and CEA-leti. This led to the first international demonstration of 200 mm wafer printing in the early 2000s, and an overview of 25 years of development was presented at NNT. In 2025, the various players in French NIL technologies are grouped together in the Rénil network and will organize the NNT conference in Paris in 2027.
